[A-5-3] Importance of Leakage Current Noise Analysis for Accurate Lifetime Prediction of High-k Gate Dielectrics

Kenji OKADA, Hiroyuki OTA, Tsuyoshi HORIKAWA, Yasuyuki TAMURA, Takaoki SASAKI, Tomonori AOYAMA, Fumio OOTSUKA, Akira TORIUMI (1.MIRAI-ASET, AIST, 2.MIRAI-ASRC, AIST, 3.Department of Materials Science, The University of Tokyo, 4.Semiconductor Leading Edge Technologies (Selete))

https://doi.org/10.7567/SSDM.2005.A-5-3