[B-2-4] Physical Origins of Surface Carrier Density Dependences of Interface- and Remote-Coulomb Scattering Mobility in Si MOS Inversion Layer

Yukio Nakabayashi、Junji Koga、Takamitsu Ishihara、Shin-ichi Takagi (1.Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation、2.Department of Frontier Informatics, Graduate School of Frontier Science, The University of Tokyo)

https://doi.org/10.7567/SSDM.2005.B-2-4