[C-2-2] Microstructural evolution of MIM capacitor prepared by ALD system at elevated temperature

C. H. Lin, C. C. Wang, P. J. Tzeng, C. S. Liang, W. M. Lo, H. Y. Li, L. S. Lee, S. C. Lo, Y. W. Chou, M-J Tsai (1.Electronics Research and Service Organization, 2.Material Research Laboratory Industrial Technology Research Institute)

https://doi.org/10.7567/SSDM.2005.C-2-2