Nano-meter order Structures of Porous Low-k Films and their Impacts on Cu/Low-k Processes

Miyako Shimada; Junichi Shimanuki; Yuji Otsuka; Takahiro Harada; Yasuhide Inoue; Shinichi Ogawa

doi:https://doi.org/10.7567/SSDM.2005.C-5-1

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜 2005年9月15日
International Conference Center Kobe, Kobe, Japan

[C-5-1] Nano-meter order Structures of Porous Low-k Films and their Impacts on Cu/Low-k Processes

Miyako Shimada、Junichi Shimanuki、Yuji Otsuka、Takahiro Harada、Yasuhide Inoue、Shinichi Ogawa (1.Semiconductor Leading Edge Technologies, Inc.、2.NISSAN ARC, Ltd.、3.Toray Research Center, Inc.)

https://doi.org/10.7567/SSDM.2005.C-5-1

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