[C-5-2] Comparison of Pore Shape Models for Small Angle X-ray Scattering of a Disordered Porous Silica Low-k Film

Naoko Kunishige、Nobuhiro Hata、Nobutoshi Fujii、Takamaro Kikkawa (1.Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Science and Technology (AIST)、2.Millenium Research for Advanced Information Technology (MIRAI)-ASRC, AIST、3.MIRAI-Association of Super-Advanced Electronics Technologies (ASET)、4.Research Center for Nanodevices and Systems, Hiroshima-University)

https://doi.org/10.7567/SSDM.2005.C-5-2