Comparison between UV and EB cure method for porous PAr / porous MSX hybrid structure

K. Fujita; H. Miyajima; S. Nakao; T. Sakanaka; R. Nakata; H. Yano; T. Yoda

doi:https://doi.org/10.7567/SSDM.2005.C-6-1

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜 2005年9月15日
International Conference Center Kobe, Kobe, Japan

[C-6-1] Comparison between UV and EB cure method for porous PAr / porous MSX hybrid structure

K. Fujita、H. Miyajima、S. Nakao、T. Sakanaka、R. Nakata、H. Yano、T. Yoda (1.Process & Manufacturing Engineering Center, Semiconductor Company Toshiba Corporation)

https://doi.org/10.7567/SSDM.2005.C-6-1

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