The Japan Society of Applied Physics

[C-9-1] Dopant Redistribution at Nickel Silicide/Silicon Interface

Takashi Yamauchi、Atsuhiro Kinoshita、Kazuya Ohuchi、Koichi Kato (1.Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation、2.SoC Research & Development Center, Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2005.C-9-1