[F-1-7] Controlled Growth of High Quality and Surface-Clean Multicomponent Thin Films for Nanoelectronics Applications by Using Substrates with Artificial Steps

Kazuhiro Endo, Petre Badica, Hiroshi Sato, Hiroshi Akoh (1.Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 2.Institute for Materials Research, Tohoku Univ., 3.National Institute of Materials Physics, Bucharest, 4.Correlated Electron Research Center (CERC), National Institute of Advanced Industrial Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2005.F-1-7