[G-1-5] Relaxation Behavior of Sputter Epitaxy Si1-xGex Film on P-Type Si(001) and NDR Observation from Hole-Tunneling RTD at RT

Junichi Kubota、Atsushi Hashimoto、Yoshiyuki Suda (1.Graduate School of Engineering, Tokyo University of Agriculture and Technology)

https://doi.org/10.7567/SSDM.2005.G-1-5