[H-1-4] Performance and Reliability of MIM (Metal-Insulator-Metal)　Capacitors with ZrO2 for 50nm DRAM Application

Kyoung-Ryul Yoon, Ki-Vin Im, Jea-Hyun Yeo, Eun-Ae Chung, Young-Sun Kim, Cha-Young Yoo, Sung-Tae Kim, U-In Chung, Joo-Tae Moon (1.Process Development Team, Semiconductor R&D Division, Samsung Electronics Co., Ltd.)

https://doi.org/10.7567/SSDM.2005.H-1-4