[H-3-1] High Density and Ultra-Low Power Mobile SRAM Using the Novel Double S3 (Stacked Single-crystal Silicon) Technology and KrF lithography

Kunho Kwak, Wonseok Cho, Jonghyuk Kim, Jaejoo Shim, Hoon Lim, Jaehoon Jeong, Changmin Hong, Jinho Kim, Hoosung Cho, Bonghyun Choi, Jooyoung Kim, Sunghyun Kwon, Soon-moon Jung, Kinam Kim (1.Advanced Technology Development 2 Team, Semiconductor R&D Center, Memory Division Samsung Electronics Co.)

https://doi.org/10.7567/SSDM.2005.H-3-1