[H-8-2] Study of the Metal-Ferroelectric-Insulator-Si Structure Device Formaton by Controlling Properties of High Frequency and Microwave Excited Plasma

Ichirou Takahashi、Hiroyuki Sakurai、Tatsunori Isogai、Akinobu Teramoto、Shigetoshi Sugawa、Tadahiro Ohmi (1.New Industry Creation Hatchery Center, Tohoku University、2.Graduate School of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.2005.H-8-2