[P1-11] Composition control of Ni-silicide by CVD using Ni(PF3)4 and Si3H8

Masato Ishikawa、Ikuyo Muramoto、Hideaki Machida、Yoshio Ohsihita、Satoshi IMAI、Atsushi OGURA (1.Tri Chemical Laboratories Inc.、2.Toyota Technological Institute、3.Meiji University)

https://doi.org/10.7567/SSDM.2005.P1-11