The Japan Society of Applied Physics

[P1-14] Germanium Out-Diffusion in HfO2 and its Impact on Electrical Properties

Qingchun Zhang、Nan Wu、Chunxiang Zhu、L.K. Bera (1.Silicon Nano Device Lab, Department of Electrical and Computer Engineering、2.National University of Singapore、3.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2005.P1-14