[P1-15] Gate Stack Integration of Germanium Oxynitride for Germanium MOSFETs

Yu-Lin Chao、Roland Scholz、Jason C. S. Woo (1.Univ. of California, Los Angeles, Dept. of Electrical Engineering, School of Eng.、2.Max-Planck Institute of Microstructure Physics)

https://doi.org/10.7567/SSDM.2005.P1-15