[P1-16] Atomistic Modeling of Boron Diffusion with Germanium Pre-amorphization for Ultra Shallow S/D Junction in nanometer-scale PMOS Devices
Byeong-Jun Kim, Jae-Hyun Yoo, Taeyoung Won
(1.Department of Electrical Engineering, School of Engineering, Inha University National IT Research Center for Computational Electronics)
https://doi.org/10.7567/SSDM.2005.P1-16
