Development of Hybrid Tight-Binding Quantum Chemical Molecular Dynamics Method and Its Application to Boron Implantation Process into Pre-amorphized Silicon Substrate

Tsuyoshi Masuda; Hideyuki Tsuboi; Michihisa Koyama; Akira Endou; Momoji Kubo; Ewa Broclawik; Akira Miyamoto

doi:https://doi.org/10.7567/SSDM.2005.P1-21

[P1-21] Development of Hybrid Tight-Binding Quantum Chemical Molecular Dynamics Method and Its Application to Boron Implantation Process into Pre-amorphized Silicon Substrate

Tsuyoshi Masuda、Hideyuki Tsuboi、Michihisa Koyama、Akira Endou、Momoji Kubo、Ewa Broclawik、Akira Miyamoto (1.Department of Applied Chemistry, Tohoku University、2.Institute of Fluid Science, Tohoku University、3.PRESTO, Japan Science and Technology Agency、4.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2005.P1-21

2005 International Conference on Solid State Devices and Materials

[P1-21] Development of Hybrid Tight-Binding Quantum Chemical Molecular Dynamics Method and Its Application to Boron Implantation Process into Pre-amorphized Silicon Substrate