[P1-22] Ultra-Shallow p+/n Junction Prepared by Low Energy BF3 Plasma Doping(PLAD) and KrF Excimer Laser Annealing
Dongkyu Lee, Sungkweon Baek, Changhee Cho, Sungho Heo, Hyunsang Hwang
(1.Gwangju Institute of Science & Technology (GIST), Dept. of Materials Sci. & Eng.)
https://doi.org/10.7567/SSDM.2005.P1-22