[P1-27] Depth Profile of Various Bonding Configration of Nitrogen Atoms in Silicon Oxynitrides formed by Plasma Nitridation

Hiroshi Nohira、Seiji Shinagawa、Tetsuya Ikuta、Mitsuaki Hori、Masataka Kase、Hideyuki Okamoto、Takeo Hattori (1.Faculty of Engineering, Musashi Institute of Technology.、2.Fujitsu Ltd.)

https://doi.org/10.7567/SSDM.2005.P1-27