The Japan Society of Applied Physics

[P1-4] Effect Of Starting Interface in Scalability/Device Performance of Ultra-Scaled ALD HfSiON/TiN Gate Stacks

M.A. Quevedo-Lopez, S. A. Krishnan, P.D. Kirsch, J. Peterson, H.-J Li, M. Kim, C. Huffman (1.SEMATECH, 2.Texas Instruments, 3.IBM, 4.Infineon, 5.University of Texas at Dallas)

https://doi.org/10.7567/SSDM.2005.P1-4