[P1-6] Threshold Voltage Instability in nMOSFETs with HfSiO/SiO2 High-k Gate Stacks

Wei-Hao Wu、Yong-Tian Hou、Yin Jin、Hun-Jan Tao、Shih-Chang Chen、Mong-Song Liang、Bing-Yue Tsui、Mao-Chieh Chen (1.Department of Electronics Engineering, National Chiao Tung University、2.Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company)

https://doi.org/10.7567/SSDM.2005.P1-6