[P1-6] Threshold Voltage Instability in nMOSFETs with HfSiO/SiO2 High-k Gate Stacks

Wei-Hao Wu, Yong-Tian Hou, Yin Jin, Hun-Jan Tao, Shih-Chang Chen, Mong-Song Liang, Bing-Yue Tsui, Mao-Chieh Chen (1.Department of Electronics Engineering, National Chiao Tung University, 2.Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company)

https://doi.org/10.7567/SSDM.2005.P1-6