[P2-1] Hydrocarbon Groups and Film Properties of SiOCH Dielectrics: Theoretical Inverstigations using Molecular Models

Nobuo Tajima、Tomoyuki Hamada、Takahisa Ohno、Katsumi Yoneda、Nobuyoshi Kobayashi、Satoshi Hasaka、Minoru Inoue (1.First Principles Simulation Group, Computational Materials Science Center, National Institute for Materials Science、2.The FSIS Center for Collaborative Research, Institute of Industrial Science, University of Tokyo、3.Research Dept. 1, Semiconductor Leading Edge Technologies, Inc. (Selete)、4.Taiyo Nippon Sanso Corporation)

https://doi.org/10.7567/SSDM.2005.P2-1