[P2-14L] Properties of Low-k (k-2.05) Plasma Polymer Films Deposited by PECVD Using Decamethyl-cyclopentasiloxane and Cyclohexane as the Precursors

Jaeyoung Yang、Sungwoo Lee、Sanghak Yeo、Donggeun Jung、Heeyeop Chae (1.Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University、2.Department of Chemical Engineering, Sungkyunkwan University)

https://doi.org/10.7567/SSDM.2005.P2-14L