Quantum Dot Formation by Post-Growth Annealing of a Wetting Layer

H. Z. SONG; T. Usuki; Y. Nakata; N. Yokoyama; H. Sasakura; S. Muto

doi:https://doi.org/10.7567/SSDM.2005.P8-12L

2005 International Conference on Solid State Devices and Materials

Sep 12, 2005 - Sep 15, 2005
International Conference Center Kobe, Kobe, Japan

[P8-12L] Quantum Dot Formation by Post-Growth Annealing of a Wetting Layer

H. Z. SONG, T. Usuki, Y. Nakata, N. Yokoyama, H. Sasakura, S. Muto (1.Nanotechnology Research Center, Fujitsu Lab. Ltd., 2.CREST, Japan Science and Technology Agency, 3.Department of Applied Physics, Hokkaido University)

https://doi.org/10.7567/SSDM.2005.P8-12L

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