[C-6-2] An Advanced Air Gap Process for MLC flash memories reducing Vth interference and realizing high reliability.

K. Tsukamoto, T. Murata, T. Fukumura, F. Ohta, T. Yoshitake, S. Shimizu, Y. Ikeda, K. Asai, M. Shimizu, O. Tsuchiya (1.Renesas Technology Corp.)

https://doi.org/10.7567/SSDM.2006.C-6-2