[C-6-2] An Advanced Air Gap Process for MLC flash memories reducing Vth interference and realizing high reliability.

K. Tsukamoto、T. Murata、T. Fukumura、F. Ohta、T. Yoshitake、S. Shimizu、Y. Ikeda、K. Asai、M. Shimizu、O. Tsuchiya (1.Renesas Technology Corp.)

https://doi.org/10.7567/SSDM.2006.C-6-2