[F-9-4] Study on Carrier Transport Limited by Coulomb Scattering due to Charged Centers in HfSiON MISFETs

Takamitsu Ishihara, Ryosuke Iijima, Mariko Takayanagi, Hiroyoshi Tanimoto, Masato Koyama (1.Advanced LSI Technology Laboratory, Corporate Research & Development Center, 2.Advanced CMOS Technology Dept., Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2006.F-9-4