[G-7-1L] The structural origin of determining the coefficient of thermal expansion for porous silica low-k films

Masahiro Yamaji, Nobuhiro Hata, Takahiro Nakayama, Yoshinori Shishida, Yasuyoshi Hyodo, Takamaro Kikkawa (1.Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 2.MIRAI-ASRC, AIST, 3.MIRAI-Association of Super-Advanced Electronics Technologies, 4.Hiroshima University)

https://doi.org/10.7567/SSDM.2006.G-7-1L