[G-7-4] Effects of Oxidizer in Metal CMP Slurry on Open Circuit Potential Change during Metal Polishing

Shohei Shima, Shintaro Kamioka, Shingo Yasuda, Hidekazu Nagano, Yutaka Wada, Katsuhiko Tokushige, Akira Fukunaga, Manabu Tsujimura (1.Ebara Corporation, Precision Machinery Company, Semiconductor Equipment Division)

https://doi.org/10.7567/SSDM.2006.G-7-4