Ionic Conduction Leakage Current in Porous Silica Films

Yasuhisa Kayaba; Kazuo Kohmura; Takamaro Kikkawa

doi:https://doi.org/10.7567/SSDM.2006.G-7-5

2006 International Conference on Solid State Devices and Materials

2006年9月12日〜 2006年9月15日
PACIFICO Yokohama, Yokohama, Japan

[G-7-5] Ionic Conduction Leakage Current in Porous Silica Films

Yasuhisa Kayaba、Kazuo Kohmura、Takamaro Kikkawa (1.Research Center for Nanodevices and Systems, Hiroshima University、2.Mitsui Chemicals, Inc. Catalyst Science Laboratory Heterogeneous Catalysis Group)

https://doi.org/10.7567/SSDM.2006.G-7-5

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