Hexagonal Boron Nitride Heteroepitaxial Layers on Graphitized 6H-SiC Substrate Grown by Metalorganic Vapor Phase Epitaxy

Yasuyuki Kobayashi; Hiroki Hibino; Tomohiro Nakamura; Tetsuya Akasaka; Toshiki Makimoto; Nobuo Matsumoto

doi:https://doi.org/10.7567/SSDM.2006.I-2-7

[I-2-7] Hexagonal Boron Nitride Heteroepitaxial Layers on Graphitized 6H-SiC Substrate Grown by Metalorganic Vapor Phase Epitaxy

Yasuyuki Kobayashi、Hiroki Hibino、Tomohiro Nakamura、Tetsuya Akasaka、Toshiki Makimoto、Nobuo Matsumoto (1.NTT Basic Research Laboratories, NTT Corporation、2.Shonan Institute of Technology)

https://doi.org/10.7567/SSDM.2006.I-2-7

2006 International Conference on Solid State Devices and Materials

[I-2-7] Hexagonal Boron Nitride Heteroepitaxial Layers on Graphitized 6H-SiC Substrate Grown by Metalorganic Vapor Phase Epitaxy