[I-8-3] Inhomogeneous strain in thin silicon films analyzed by grazing incidence x-ray diffraction

H. Omi、T. Kawamura、Y. Kobayashi、S. Fujikawa、Y. Tsusaka、Y. Kagoshima、J. Matsui (1.NTT Basic Research Laboratories, NTT Corporation、2.Graduate School of Material Science, University of Hyogo、3.Center for Advanced Science & Technology, Japan)

https://doi.org/10.7567/SSDM.2006.I-8-3