[I-8-3] Inhomogeneous strain in thin silicon films analyzed by grazing incidence x-ray diffraction

H. Omi, T. Kawamura, Y. Kobayashi, S. Fujikawa, Y. Tsusaka, Y. Kagoshima, J. Matsui (1.NTT Basic Research Laboratories, NTT Corporation, 2.Graduate School of Material Science, University of Hyogo, 3.Center for Advanced Science & Technology, Japan)

https://doi.org/10.7567/SSDM.2006.I-8-3