[I-8-4] Characterization of Epitaxial Silicon Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition at Low Temperatures (450-600℃)

Naotaka Tawara, Hiromasa Ohmi, Yoshikazu Terai, Hiroaki Kakiuchi, Heiji Watanabe, Yasufumi Fujiwara, Kiyoshi Yasutake (1.Department of Precision Science and Technology, Graduate School of Engineering, 2.Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University)

https://doi.org/10.7567/SSDM.2006.I-8-4