[J-2-1] Evaluation of Chemical Structures and Work Function of NiSi near the Interface between Nickel Silicide and SiO2

A. Ohta, H. Yoshinaga, H. Murakami, D. Azuma, Y. Munetaka, S. Higashi, S. Miyazaki, T. Aoyama, K. Kosaka, K. Shibahara (1.Grad. School of AdSM, Hiroshima Univ., 2.Fujitsu Laboratories Ltd., 3.Research Center for Nanodevices and Systems, Hiroshima Univ.)

https://doi.org/10.7567/SSDM.2006.J-2-1