[J-5-2] Excellent Leakage Current of Crystallized Silicon-Doped HfO2 Films Down to Sub-nm EOT

Kazuyuki Tomida、Koji Kita、Akira Toriumi (1.Department of Materials Engineering, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2006.J-5-2