[J-5-3] Spatial Fluctuation of Electrical properties in Hf-Silicate Film Observed with Scanning Capacitance Microscopy

Y. Naitou、A. Ando、H. Ogiso、S. Kamiyama、Y. Nara、H. Watanabe、K. Yasutake (1.AIST-NeRI、2.AIST-Advanced Manufacturing Research Institute、3.Selete、4.Osaka Univ.)

https://doi.org/10.7567/SSDM.2006.J-5-3