[J-5-3] Spatial Fluctuation of Electrical properties in Hf-Silicate Film Observed with Scanning Capacitance Microscopy

Y. Naitou, A. Ando, H. Ogiso, S. Kamiyama, Y. Nara, H. Watanabe, K. Yasutake (1.AIST-NeRI, 2.AIST-Advanced Manufacturing Research Institute, 3.Selete, 4.Osaka Univ.)

https://doi.org/10.7567/SSDM.2006.J-5-3