The Highly Reliable Evaluation of Mobility in an Ultra Thin High-k Gate Stack with an Advanced Pulse Measurement Method

Ryosuke Iijima; Mariko Takayanagi; Masato Koyama; Akira Nishiyama

doi:https://doi.org/10.7567/SSDM.2006.J-7-4

[J-7-4] The Highly Reliable Evaluation of Mobility in an Ultra Thin High-k Gate Stack with an Advanced Pulse Measurement Method

Ryosuke Iijima, Mariko Takayanagi, Masato Koyama, Akira Nishiyama (1.Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation, 2.Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company)

https://doi.org/10.7567/SSDM.2006.J-7-4

2006 International Conference on Solid State Devices and Materials

[J-7-4] The Highly Reliable Evaluation of Mobility in an Ultra Thin High-k Gate Stack with an Advanced Pulse Measurement Method