The Japan Society of Applied Physics

[J-9-4] Impact of Initial Traps on TDDB and NBTI Reliabilities in High-k Gate Dielectrics

Kenji OKADA, Hiroyuki OTA, Tsuyoshi HORIKAWA, Masaru KADOSHIMA, Arito OGAWA, Toshihide NABATAME, Akira TORIUMI (1.MIRAI-ASET, AIST, 2.MIRAI-ASRC-AIST, 3.The University of Tokyo)

https://doi.org/10.7567/SSDM.2006.J-9-4