[P-1-19] Nitrogen Induced Extrinsic States (NIES) in Effective Work Function Instability of TiNx/SiO2 and TiNx/HfO2 Gate Stacks

Chao-Sung Lai、Jer-Chyi Wang、Shih-Cheng Yang、Jian-Yi Wong、Shing-Kan Peng (1.Department of Electronic Engineering, Chang Gung University、2.Nanya Technology Corporation, Hwa-Ya Technology Park)

https://doi.org/10.7567/SSDM.2006.P-1-19