[P-1-22] Stress-Relaxation Process during Post-Annealing in SGOI Formed by H+ Irradiation and Oxidation-Induced Ge Condensation

Masanori Tanaka, Taizoh Sadoh, Koji Matsumoto, Toyotsugu Enokida, Masanobu Miyao (1.Department of Electronics, Kyushu University, 2.SUMCO, 3.Analyses & Evaluation Center, Fukuryo Semicon Engineering Corporation)

https://doi.org/10.7567/SSDM.2006.P-1-22