[P-1-28] Effects of CF3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes

Yoshinari Ichihashi、Yasushi Ishikawa、Ryu Shimizu、Hideki Mizuhara、Mitsuru Okigawa、Seiji Samukawa (1.Institute of Fluid Science, Tohoku University、2.Sanyo Electric Co.,Ltd.)

https://doi.org/10.7567/SSDM.2006.P-1-28