Effects of CF3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes

Yoshinari Ichihashi; Yasushi Ishikawa; Ryu Shimizu; Hideki Mizuhara; Mitsuru Okigawa; Seiji Samukawa

doi:https://doi.org/10.7567/SSDM.2006.P-1-28

[P-1-28] Effects of CF3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes

Yoshinari Ichihashi, Yasushi Ishikawa, Ryu Shimizu, Hideki Mizuhara, Mitsuru Okigawa, Seiji Samukawa (1.Institute of Fluid Science, Tohoku University, 2.Sanyo Electric Co.,Ltd.)

https://doi.org/10.7567/SSDM.2006.P-1-28

2006 International Conference on Solid State Devices and Materials

[P-1-28] Effects of CF3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes