[P-1-7] Impact of PVD-based In-situ Fabrication Method for Metal/High-k Gate Stacks

Shinya Horie, Takashi Minami, Naomu Kitano, Motomu Kosuda, Heiji Watanabe, Kiyoshi Yasutake (1.Graduate School of Engineering, Osaka University, 2.Canon ANELVA Corporation)

https://doi.org/10.7567/SSDM.2006.P-1-7