[P-1-7] Impact of PVD-based In-situ Fabrication Method for Metal/High-k Gate Stacks

Shinya Horie、Takashi Minami、Naomu Kitano、Motomu Kosuda、Heiji Watanabe、Kiyoshi Yasutake (1.Graduate School of Engineering, Osaka University、2.Canon ANELVA Corporation)

https://doi.org/10.7567/SSDM.2006.P-1-7