The Japan Society of Applied Physics

[P-11-5] Modifications on pH sensitivity of Si3N4 membrane by CF4 plasma and rapid thermal annealing for ISFET/REFET applications

Chao-Sung Lai、Cheng-En Lue、Chia-Ming Yang、Jui-Hsiu Jao (1.Department of Electronic Engineering, Chang Gung University)

https://doi.org/10.7567/SSDM.2006.P-11-5