Modifications on pH sensitivity of Si3N4 membrane by CF4 plasma and rapid thermal annealing for ISFET/REFET applications

2006 International Conference on Solid State Devices and Materials

Sep 12, 2006 - Sep 15, 2006
PACIFICO Yokohama, Yokohama, Japan

Chao-Sung Lai, Cheng-En Lue, Chia-Ming Yang, Jui-Hsiu Jao (1.Department of Electronic Engineering, Chang Gung University)