[P-2-11] Effectiveness of Titanium and Carbon capping layer in NiSi formation with Ni film deposited by Atomic Layer Deposition

C. M. Yang, S. W Yun, J. B. Ha, K. I. Na, H. I. Cho, H. B. Lee, J. H. Jeong, S. H. Hahm, S. H. Kong, J. H. Lee (1.School of Electrical Engineering and Computer Science, Kyungpook National University)

https://doi.org/10.7567/SSDM.2006.P-2-11